(PhysOrg.com) -- As computer chips rapidly continue to evolve, new technologies must be developed to closely monitor the fabrication process and guard against faults at a sub-microscopic level. More ...

Optical scatterometry is a non-destructive metrology technique used to characterize periodic nanostructures, such as gratings, arrays, and patterned surfaces. It involves measuring the intensity and ...

Scatterometry is the favored approach to monitor complex 3D nano-structures in production. At SPIE Advanced Lithography, KLA introduced a new generation of their scatterometry metrology system. The ...

Nano-electronics research center imec and Nova Measuring Instruments (Nasdaq: NVMI), a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor ...

Metrology is proving to be a major challenge for those foundries working on processes for gate-all-around FETs at 3nm and beyond. Metrology is the art of measuring and characterizing structures in ...

SANTA CLARA, Calif.–Inline optical technology such as scatterometry may be coming into vogue, but there is still a place for traditional offline scanning electron microscope (SEM) metrology technology ...

As computer chips rapidly continue to evolve, new technologies must be developed to closely monitor the fabrication process and guard against faults at a sub-microscopic level. As computer chips ...

More than 40 years ago Intel co-founder Gordon Moore predicted the capacity of computer chips would double every two years for a 10-year period. He was wrong about the time, but right about the rest.